Plasma I-BEAM RF Series User manual

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I-BEAM RF POWER SUPPLY
MANUAL
ESTABLISHED 2003

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Thank you for purchasing an ion beam source power supply from Plasma Process Group! We want your new source
to operate safely. Anyone who installs or operates this equipment should read this publication (and any other
manuals) before installing or using the ion beam source, neutralizer and power supply.
All applicable local and national codes that regulate the installation and operation of this electronic equipment
should be followed. It is your responsibility to determine the codes that apply to your area.
Please follow all applicable sections of the National Fire Code, National Electronic Code, and the codes of the
National Electrical Manufacturer’s Association (NEMA). Consult with your local government to help determine
which codes are necessary for safe installation. Failure to comply with applicable codes and standards may
result in equipment damage or serious injury to personnel.
Our equipment is designed for laboratory or production vacuum environments. The external interlock for the
ion beam source power supply should be connected to your facility to ensure maximum safety and prohibit
usage of the equipment when unsafe conditions arise. Failure to use the external interlock is considered “High
Risk Activities” where personal injury or equipment damage may result. Plasma Process Group specically
disclaims any expressed or implied warranty for High Risk Activities.
The ion beam power supply has been CE certied and the electronic discharges for the source and neutralizer
are created using industry standard radio frequency (RF) methods. Improper installation of this equipment may
result in disruptions with other sensitive electronic equipment.
If you have any questions regarding the installation and operation of this equipment, please contact us immediately at
970-663-6988 or [email protected].
We at Plasma Process Group hope that using your new ion beam source will produce rewarding results.
Copyright © 2019 by Plasma Process Group, Inc. All rights reserved.
7330 Greendale Road, Windsor, CO 80550 USA
Phone [phone] • Fax [phone]
No part of this publication may be reproduced without prior written permission
Date: November 2019 REV P2
Safety
WARNING
HAZARDOUS VOLTAGE – ion beam sources are to be serviced
and operated by trained personnel only.

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For Service or Repair please contact us at 970-663-6988 or send an email to [email protected].
Before contacting us please have ready the following information about the issue:
Many issues can be solved over the phone or email.
In the event hardware needs to be returned, all equipment, including warranty, returned to Plasma Process
Group (PPG) requires a return authorization (RA) number. Our support team will provide a return request form
with instructions to start the process. This form is also located at our website plasmaprocessgroup.com (see
Resources then Terms and Forms). Special instructions will apply to international customers.
Our workmanship warranty can be found at our website plasmaprocessgroup.com (see Resources then Terms
and Forms).
Service and Technical Support
• Product type
• Model and serial number
• Date purchased
• List of all the operating parameters
• Error messages on power supply
• Gas ow to the source, neutralizer and background
• Chamber pressure
Warranty

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This manual uses these symbols to indicate potential hazards.
ALERT - This symbol is used for tips and other pointers.
Warning Statements
Warning- Risk of Injury to Persons
This symbol is used to warn of a heavy lift operation.
CAUTION
This symbol is used to alert of a potential risk to person or equip-
ment.
WARNING
This symbol illustrates a electrical shock hazard.

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Table of Contents
Chapter 1: Getting Started 6
Section 1.1: Terminology 6
Section 1.2: Overview 8
Chapter 2: Installation 11
Section 2.1: General Requirements 11
Section 2.2: Unpacking 12
Section 2.3: Connection Layout 12
Section 2.4: Mounting and Air Cooling 13
Section 2.5: Source and Neutralizer Connections 14
Section 2.6: Communication and Switches 16
Section 2.7: External Generator or Legacy Installation 18
Section 2.8: Preight Check 19
Section 2.9: Input Power 20
Chapter 3: Specications 21
Section 3.1: Specications for I-BEAM RF Series 21
Chapter 4: Operation 22
Section 4.1: Power On 22
Section 4.2: Layout 22
Section 4.3: Mode of Operation for the Source 23
Section 4.4: Adjustments using Keypad Entry 24
Section 4.5: Interface Examples 28
Section 4.6: Beam and Source ON/OFF 29
Section 4.7: Quick Start Sequence 30
Section 4.8: Additional Resources 33
Chapter 5: Remote Control 34
Section 5.1: RS232 Communications 34
Section 5.2: RS232 Command Details 36
Section 5.3: Operation Example 42
Section 5.4: Remote Switches 43
Chapter 6: Troubleshooting 44
Section 6.1: Common Issues and Quick Fixes 45
Section 6.2: Power Supply Error Codes 46
Section 6.3: RF Neutralizer (RFN) Errors 49
Section 6.4: Starting the Source 51
Section 6.5: Turning on the Beam 52
Section 6.6: Additional Resources 53
Appendix A: Legacy Installation 54
Section A.1: Hardware Kit 54
Section A.2: Installation Location 55
Section A.3: Installation of an I-BEAM 703 with IBOX 56
Section A.4: Installation of an I-BEAM 701 with IBOX 57
Section A.5: Pin Outs for the IBOX 58
Appendix B: Match Network Tuning 59
Section B.1: Denitions 59
Section B.2: Setup 62
Section B.3: Tuning Procedure 63
Section B.4: Setting the Presets 64

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Ion beam technology was developed at NASA in the 1960s as a means of producing thrust on
spacecraft. Today, ion beam sources are used on vacuum systems for depositing precise thin lm
coatings of oxides, diamond-like carbon, and other useful materials on optical and mechanical
components.
This manual covers the installation and operation of the I-BEAM power supply controller for the
radio frequency (RF) ion beam source products we oer.
Section 1.1: Terminology
The function of an ion beam source is to produce ions
and accelerate these ions to high velocities so they
are ejected downstream from the source. The ejected
ions are directed to form a “beam” in which they all
have the same energy and can be directed to a target
or other substrate. At low energies, the ion beam is
useful for etching or cleaning parts. At high energies,
the ion beam can be used to sputter target materials.
An RF ion source package consists of the ion beam
source, an RF neutralizer (RFN), feedthroughs, power
supply(s), RF matching network, and cables. To install
the source in a vacuum system, feedthroughs are
used and these combined with additional hardware
form an interface kit.
Chapter 1: Getting Started
Ion beam striking a target.
The hardware unpacked.
I-BEAM RF POWER SUPPLY MANUAL

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I-BEAM RF POWER SUPPLY MANUAL Chapter 1: Getting Started
Depending upon the conguration, the source
may already be attached to the interface kit. This
is common for ange mounted sources. For these
cases, the matching network is also attached and the
entire assembly just requires installation. Internal
mount kits will come with individual feedthroughs
that require installation into the vacuum system
before the source can be attached.
Inside the source are the key elements for operation.
These include the gas inlet (also called gas isolator),
the RF antenna (also called coil), discharge chamber
and grids. Process gas, such as high purity Argon,
is fed into the discharge chamber. The RF antenna
will then excite free electrons causing ionization of
the process gas. A plasma is then created inside
the discharge chamber. A plasma is an electrically
conductive gas where the density of ions and
electrons are approximately equal.
All RF ion beam sources will have these same key
elements. Only the sizes and geometries will dier
for antennas, grids, and discharge chambers.
Source and interface kit assembly.
Inside the source.
The RF ion beam source family.

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I-BEAM RF POWER SUPPLY MANUAL Chapter 1: Getting Started
ION BEAM PARAMETERS
PARAMETER DEFINITION UNIT
Source Gas Flow Process gas delivered to the discharge chamber. sccm
RF Forward Power The RF power applied to the matching network. This controls the
ion production rate W
RF Reected Power The RF power returned from the matching network. W
Beam Voltage Positive voltage applied to the screen grid (ion energy). V
Beam Current The total ion current leaving the source. mA
Accel Voltage Negative voltage applied to the accelerator grid. V
Accel Current Current collected by accelerator grid (charge-exchange). mA
A/B Ratio Ratio of accel to beam current. Typical A/B is < 10%. %
Section 1.2: Overview
The schematic below illustrates how the key elements work inside the source. Process gas is supplied to
the discharge chamber. The RF antenna is tuned using the matching network where its voltages can reach
upwards of ±2500 V. The oscillating eld will excite free electrons that can ionize the process gas and sustain
a plasma discharge (ions and electrons). Ions created in the discharge chamber that drift towards the grids
are then accelerated to high velocities with electrostatic potential applied to the grids. The screen grid is
biased positive, the accelerator grid is biased negative and the decelerator grid is grounded.
Electrical schematic for the RF ion beam source.

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I-BEAM RF POWER SUPPLY MANUAL Chapter 1: Getting Started
The grids, which control the ion optics, will come in
dierent shapes, sizes and materials. They can be
at (i.e. graphite) or dished (i.e. molybdenum) to
promote beam shape and trajectories. The inner
most grid is called the screen grid (biased positive)
and the middle grid is called the accelerator (biased
negative). Most grid assemblies will have 3 grids
where the decelerator will act as a shield to the other
two grids and capture process material coming back
to the source. Additional information about the grid
operation and design can be found in the Ion Beam RF
Sources Manual.
A neutralizer is placed downstream from the source
where it emits electrons to balance the number
of positive ions which leave the source. The RFN
operates in a similar fashion to the source as it
requires process gas, has an RF antenna and its own
matching network. Please refer to its manual for a
detailed description of its operation and additional
information.
The RFN needs to be placed so that its electrons can
couple (or “see”) the ion beam. It is very important
that these electrons have a close (about 150 mm),
unobstructed path to the beam to ensure stable,
noise free operation. The RFN should also be located
away from strong magnets or shielded from magnetic
elds using 400 series stainless steel. A common
challenge will be to protect the RFN from process
material that can coat its keeper - but allow for
electrons to couple.
Electrons from the neutralizer do not recombine
with source ions, rather they provide space-charge-
neutralization for the downstream plasma. Under
normal operation, the neutralizer will emit between
125% to 200% of the measured beam current. In this
fashion substrates or targets downstream will not
suer damage due to arcing or surface charging.
Typical grids before assembly.
Place the RFN in close proximity to the ion beam.
The RFN will emit more electrons than ions from
the source.

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I-BEAM RF POWER SUPPLY MANUAL Chapter 1: Getting Started
The source and RFN are both controlled using
the I-BEAM power supply. The I-BEAM supply is
connected to the source, RFN and it will monitor the
source matching network controller. It houses the
beam, accel, RF power for the source and power
supplies necessary for the RFN. There are three
modes of control. These are “Manual” which provides
full RF control, “Local” which allows direct beam
current control, and “Remote” for system interface.
The table below are the critical operating parameters
for the RFN. The I-BEAM ion source controller.
NEUTRALIZER PARAMETERS
PARAMETER DEFINITION UNIT
RFN Gas Flow Gas delivered to the neutralizer. sccm
RFN Forward Power The RF power applied to the matching network. W
RFN Reected Power The RF power reected from the matching network. W
Keeper Current Discharge current between keeper and collector. Typical is
300 mA. mA
Keeper Voltage Voltage applied to keeper. Lower than 30 V is preferred. V
Neutralizer Emission
Current The electron current emitted by the neutralizer. mA
E/B Ratio Ratio of neutralizer emission to beam current. Typical E/B
is 125% or greater to minimize surface charging and arcing. %

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This chapter will cover the installation of the power supply. Please contact us with any concerns or issues that
arise during the installation of the power supply. Please consult the Ion Beam RF Sources Manual for a complete
description of the source installation procedure.
Section 2.1: General Requirements
Vacuum system
The source will require a modest vacuum system capable of handling some gas ow. Typical pumping stations
will have either a diusion or cryo high vacuum pump. The pumping speed must be appropriate for the ion
source selected which will fall within a range from 1500 to 6000 L/s air. The base pressure for the machine
should be low 10-6 mbar and even a lower water vapor pressure. With the source, RFN and process gases the
chamber pressure should not exceed 5x10-4 mbar during operation.
Electrical
The vacuum system should have an earth ground. A grounding line should be installed between the I-BEAM and
the vacuum chamber earth ground. The I-BEAM supply requires 208 VAC, 50/60 Hz single phase at 16A. The
matching network controller will require 110 VAC, 50/60 Hz. Cables between the I-BEAM supply and source (or
RFN) should be fully seated. Remaining cable should be looped and secured with tie wraps. The I-BEAM supply
and matching network controller need to be mounted to the well ventilated 19” rack.
Safety
The I-BEAM power supply has a switch closure interlock that needs to be interfaced with the facilities. Industry
standard is to safe guard the power supply and only allow for the source to be run when the vacuum pumping
station is ready, gas and coolant ows are nominal. All facilities should have an emergency power o (EPO)
switch that will break the interlock and turn power o to the supply.
Chapter 2: Installation
I-BEAM RF POWER SUPPLY MANUAL
WARNING
This power supply produces high voltage outputs. Do not operate the
unit with missing or improper connections. The interlock needs to
be incorporated into the facility/system interlock string. There are no
serviceable parts inside the unit. Do not remove the cover.

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I-BEAM RF POWER SUPPLY MANUAL CHAPTER 2: Installation
Section 2.2: Unpacking
We take extra care in packaging our equipment for shipment. Please inspect all containers for any shipping
damage. Send us a photo of the shipping container if there are any issues. Handle all equipment with care.
Personal protection
Eye protection should always be worn. All equipment should be handled with clean room grade Nitrile™ or
Latex™ gloves.
It is recommended to stage the installation away from the shipping container. Care should be taken to minimize
particulate contamination such as hair and dust while the source is being assembled and installed.
Power Supply
The I-BEAM supply should be lifted with two people and placed on a cart. The matching network controller
should also be located and unpacked. All of the cables can be removed from their plastic bags.
Section 2.3: Connection Layout
On the back of the I-BEAM are the electrical connections for the source, neutralizer and communication cables.
The I-BEAM 701 will not have the RF output for the source. The I-BEAM 702 will not have RF and DC output for
the source. Prepare the location for the power supply with adequate access to these connections
Warning- Lift hazard
Best practice is to have 2 people lift the source and power supply.
View of the power supply rear panel.

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Section 2.4: Mounting and Air Cooling
The power supply is designed to be installed in a standard 19" equipment rack adjacent to the vacuum system.
For safety, the top, bottom, sides and rear should not be accessible while the power is ON and operating. When
installed in an equipment rack, it must be supported with rails or slides in the cabinet.
I-BEAM RF POWER SUPPLY MANUAL CHAPTER 2: Installation
Warning- Risk of Injury to Persons
Use 2 people to lift and move the supply for mounting.
Place the power supply in an equipment rack.
TIP - Do not use the ears to support the weight of the power supply.
Ensure the chassis has adequate air for cooling.
TIP - Leave plenty of access behind the power supply. Do not block the sides of the
power supply.

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Section 2.5: Source and Neutralizer Connections
Connect the RED source cable to the I-BEAM 4 pin SOURCE output connector. Connect the other end of the
cable to the source interface kit. This cable provides connections to the source screen (beam) and accelerator
grids. Connect the RED RF cable to the RFS out on the I-BEAM and the RF in on the source matching network.
I-BEAM RF POWER SUPPLY MANUAL CHAPTER 2: Installation
Pin outs for the RED source cables.
Source DC cable. Source RF cable.

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Connect the BLUE neutralizer cable to the I-BEAM 5 pin NEUTRALIZER output connector. Connect the other end
of the cable to the RFN matching network. This cable provides the DC bias connections for the RFN's keeper and
collector as well as starting relay control. Connect the BLUE RF cable to the RFN out on the I-BEAM and the RF in
on the neutralizer matching network.
I-BEAM RF POWER SUPPLY MANUAL CHAPTER 2: Installation
Pin outs for the BLUE neutralizer cables.
Neutralizer DC cable. Neutralizer RF cable.

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Section 2.6: Communication and Switches
User COM port
The USER COM port is designed for remote connections to a RS232 device for remote control and monitoring.
Please see Chapter 5 - Remote Control for a complete description of the electrical wiring and commands that can
be sent to the I-BEAM via RS232 protocol.
I-BEAM RF POWER SUPPLY MANUAL CHAPTER 2: Installation
Matching network communication cable.
COM 2 port
The COM 2 port is used to control and monitor the
source matching network and its controller. The
I-BEAM will provide presets for the starting position of
the matching network capacitors as well as monitor
their position.
1
1
2
2
3
3
4
4
5
5
6
6
7
7
8
8
D D
C C
B B
A A
Size:
Drawing number:
Rev:
Sheet of
Change Description Date:
Description:
PPG_A3
Thisdrawing is the propertyof
plasma process group and may
not be used, reproduced,
publishedor disclosed to
others without express
authorization from plasma
process group.
R1
1 1
11/6/19
CREATE MANUAL CONNECTIONS
+5
4.7K
GND
1
2
3
4
5
6
7
8
9
DB 9 FEMALE
+5
56K
1
2 3
4
PC452
10
9 2
3
1
47
8
+5
56K
1
2 3
4
PC452
1
2
3
4
5
6
7
8
9
DB 9 MALE
GND
GND
GND
GND
GND
SOURCE SWITCH
INTERLOCK SWITCH
BEAM SWITCH
+5 TO +24VDC
BEAM ON
STATUS
SOURCE ON
STATUS
USER MUST SUPPLY VOLTAGE
CAN SINK UP TO +24V @ 50MA
SEE NOTE 1
NOTE 1
+5 TO +24VDC
PIN 8 AND 9 SHORTED WHEN INTERLOCK IS MADE
DO NOT EXCEED +24V @ 100MA
INSIDE IBEAM POWER SUPPLY END USER CONNECTIONS
PIN 1
PIN 2
PIN 3
PIN 4
PIN 5
PIN 6
PIN 7
PIN 8
PIN 9
DB 9 MALE PIN
GND
1
2
3
4
5
6
7
8
9
DB 9 FEMALE
1
2
3
4
5
6
7
8
9
DB 9 MALE
GND
RECEIVE DATA
SIGNAL GND
TRANSMIT DATA
INSIDE IBEAM POWER SUPPLY END USER RS232 CONNECTIONS
PIN 2
PIN 3
PIN 5
TXD
RXD
SIGNAL GND
+12
150 1/2w
STANDARD PC CONNECTION
MANUAL DRAWINGS 11/7/19
SPECIAL MANUAL DRAWINGS
Pin outs for the RS232 connections.

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I-BEAM RF POWER SUPPLY MANUAL CHAPTER 2: Installation
1
1
2
2
3
3
4
4
5
5
6
6
7
7
8
8
D D
C C
B B
A A
Size:
Drawing number:
Rev:
Sheet of
Change Description Date:
Description:
PPG_A3
Thisdrawing is the propertyof
plasma process group and may
not be used, reproduced,
publishedor disclosed to
others without express
authorization from plasma
process group.
R1
1 1
11/6/19
CREATE MANUAL CONNECTIONS
+5
4.7K
GND
1
2
3
4
5
6
7
8
9
DB 9 FEMALE
+5
56K
1
2 3
4
PC452
10
9 2
3
1
47
8
+5
56K
1
2 3
4
PC452
1
2
3
4
5
6
7
8
9
DB 9 MALE
GND
GND
GND
GND
GND
SOURCE SWITCH
INTERLOCK SWITCH
BEAM SWITCH
+5 TO +24VDC
BEAM ON
STATUS
SOURCE ON
STATUS
USER MUST SUPPLY VOLTAGE
CAN SINK UP TO +24V @ 50MA
SEE NOTE 1
NOTE 1
+5 TO +24VDC
PIN 8 AND 9 SHORTED WHEN INTERLOCK IS MADE
DO NOT EXCEED +24V @ 100MA
INSIDE IBEAM POWER SUPPLY END USER CONNECTIONS
PIN 1
PIN 2
PIN 3
PIN 4
PIN 5
PIN 6
PIN 7
PIN 8
PIN 9
DB 9 MALE PIN
GND
1
2
3
4
5
6
7
8
9
DB 9 FEMALE
1
2
3
4
5
6
7
8
9
DB 9 MALE
GND
RECEIVE DATA
SIGNAL GND
TRANSMIT DATA
INSIDE IBEAM POWER SUPPLY END USER RS232 CONNECTIONS
PIN 2
PIN 3
PIN 5
TXD
RXD
SIGNAL GND
+12
150 1/2w
STANDARD PC CONNECTION
MANUAL DRAWINGS 11/7/19
SPECIAL MANUAL DRAWINGS
Pin outs for the interlock and remote switch.
INTERLOCK and REMOTE SWITCH port
The INTERLOCK port is provided so the power supply can be connected into a system for safety. The interlock is
satised when it is shorted to ground. If needed, pins 8 and 9 can be used to sense interlock status.
At this same connector, pins are provided for remote switching and sensing for systems that use a
programmable logic controller. The source and beam can be turned ON and OFF and their status can be
monitored. Please see Chapter 5 - Remote Control for a complete description of this feature.

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Section 2.7: External Generator or Legacy Installation
I-BEAM power supplies which have an interface box (IBOX) are designed for sources that require an external
generator (I-BEAM 701 series) or the installation of the supply into older systems. A complete description of the
connections is provided in Appendix A - Legacy Installation.
• The USER COM port is designed for remote connections to a RS232 device for remote control and
monitoring. Please see Chapter 5 - Remote Control for a complete description of the electrical wiring
and commands that can be sent to the I-BEAM via RS232 protocol.
• The RF GENERATOR port connects either an external 1 kW RF generator or legacy generator.
• The GFC PORT is designed for systems that use legacy gas ow equipment. Gas is turned ON and
OFF through a recall process on the power supply.
• The INTERLOCK connector is standard for the legacy equipment.
• The USER INTERFACE allows direct pin-for-pin connection to legacy system communication cables.
• The MATCHING NETWORK port connects to the matching network controller using the legacy
cable.
I-BEAM RF POWER SUPPLY MANUAL CHAPTER 2: Installation
Power supply rear panel with IBOX.

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Section 2.8: Preight Check
Use the illustration below and conrm the cable connections are in place for all of the items.
I-BEAM RF POWER SUPPLY MANUAL CHAPTER 2: Installation
Electrical connection setup for I-BEAM RF series power supplies.

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Section 2.9: Input Power
The input power requirement is 208VAC, 1ø, 50/60 Hz
at 16 Amp. Proper wiring for the power connection is
GROUND (green / yellow stripe) and 2 HOT (brown or
blue). Use the cable provided to wire the correct plug.
Install the plug cover to keep the cable secure.
Connect the power supply chassis ground to the
facility ground. Best practice is to ensure the vacuum
tank is also connected to the facility ground.
After power is connected to the I-BEAM, turn the
MAIN breaker ON. Use the AC VOLTAGE SENSE
located on the rear panel of the power supply to
ensure proper facility voltage is applied.
Facility Voltage Condition
less than 30VAC LED is not illuminated
30 to 179VAC LED is RED or low
180 to 239VAC LED is GREEN, power is OK
240 to 250VAC LED is BLUE or high
If the LED is GREEN, the power supply can be powered
up safely from the front panel (see Chapter 4 -
Operation).
I-BEAM RF POWER SUPPLY MANUAL CHAPTER 2: Installation
Electrical power connections.
TIP - The vacuum tank, frame, system electronics and facilities should utilize a single-
point-ground scheme.
Chassis ground post below plug cover.
LED indicates facility power is OK.