seikoh giken SFP-550 User manual

SFP-550 Polishing Process Manual
FP-PM55 (Rev. 6.3)
SFP-550
Polishing Process Manual
296-1, Matushidai, Matsudo-Shi, Chiba 270-2214 Japan
TEL: [phone] FAX: [phone]

SFP-550 Polishing Process Manual
FP-PM55 (Rev. 6.3)
1/20
INTRODUCTION
This manual covers polishing conditions and procedures with SFP-550
Polishing Machine. The polishing conditions in this manual are standard
and recommendable for the polishing applicable to our optical Zirconia
ferrule. Polishing conditions need to be changed applying to each
connector type, ferrule shape and material.
NOTE
Before polishing, also read Operating Manual and Maintenance Manual
of SFP-550 along with this manual.

SFP-550 Polishing Process Manual
FP-PM55 (Rev. 6.3)
2/20
---------------------------Table of Contents---------------------------
§1 Introduction of IPC Holder 3
§2 Instruction of Polishing Film / Pad 4
Standard IPC Holder Process
§3 D 2.5mm Pre-radius Ferrule, HPC Convex Polishing 6
§4 D 1.25mm Ferrule, HPC Convex Polishing 7
§5 D 2.5m Ferrule APC Polishing (w/o Tuning) 8
§6 LC / MU Plug APC Polishing (w/o Tuning) 9
Mega-axis Holder Process
§7 Instruction of Mega-axis IPC Holder 11
§8 D2.5mm Pre-radius Ferrule, HPC Convex Polishing 12
§9 D1.25mm Ferrule, HPC Convex Polishing 13
§10 SC Plug APC Polishing (w/o Tuning) 14
§11 LC Plug APC Polishing (w/o Tuning) 15

SFP-550 Polishing Process Manual
FP-PM55 (Rev. 6.3)
3/20
§1 Introduction of IPC Holder
Please make sure that Zr ferrule does not have any epoxy or debris on side
face. These epoxy or debris may affect polishing performance because of
changing spring pressure from IPC (Independent Pressure Control) system.
In addition, to clean ferrule insertion hole is necessary as regular maintenance
to avoid debris to stick inside the hole. Please use HCB-250 (for 2.5mm hole)
or HCB-125 (for 1.25mm hole) brush with IPA for cleaning. After brushing,
brow compressed air to the cleaned insertion hole.
* Cleaning Method Using HCB-250 / 125
1) Insert the brush into the hole from upper side of the holder. (Pic.1).
2) Keep inserting the brush to the other side (Pic. 2).
3) Repeat this cleaning method several times until the hole is cleaned up. Try
to put alcohol to the brush for cleaning if foreign substances are still
adhered in spite of many trials.
Pic. 1 Pic. 2
Using brush for cleaning Viewed from bottom

SFP-550 Polishing Process Manual
FP-PM55 (Rev. 6.3)
4/20
§2 Instruction of Polishing Film / Pad
2-1) Rubber pad (PR5X-500-**)
To avoid pealing problem during polishing, please follow the instruction
below when you attach polishing film to rubber pad.
1) Place rubber pad on flat & solid object such as glass plate (Pic. 3).
2) Place a few drops of PURIFIED WATER (Pic. 3) and wipe with lint-free
tissue to remove moisture (Pic. 4).
3) Place the polishing film on the rubber pad and remove bubbles
between the pad and the film by roller (Pic. 5).
Pic. 3 Pic. 4
Pic. 5

SFP-550 Polishing Process Manual
FP-PM55 (Rev. 6.3)
5/20
2-2) Sponge pad (PS5X-500-00)
Sponge pad is necessary for adhesive removal step to reduce the
grinding pressure to avoid a fiber crack problem. We recommend using
“repositionable spray glue” to attach polishing film to the sponge pad.
The spray glue is durable and can be used several times with one spray
brow.
Pic. 6 Pic. 7
Pic. 8

SFP-550 Polishing Process Manual
FP-PM55 (Rev. 6.3)
6/20
§3 D 2.5mm Pre-radius Ferrule, HPC Convex Polishing
Polishing Holder (Standard IPC Holder):
PH55-FF-20 (D 2.5mm Ferrule)
PH55-FP-20 (FC Plug)
PH55-CP-20 (SC Plug)
PH55-SP-20 (ST Plug)
POLISHING CONDITIONS
POLISHING
PROCESS POLISHING PAD
POLISHING
FILM
(service life)
POLISHING
LIQUID
POLISHING
TIME (min) PRESSURE
ADHESIVE
REMOVAL PS5X-500-00 GA5D (5) NONE 0.5 NONE
FIRST
POLISHING
PR5X-500-80 DR5D-9u
(30)
PURIFIED
WATER 0.5
AFTER 10
TURNTABLE
REVOLUTIONS
SECOND
POLISHING
PR5X-500-80 DJ5D-1u
(30)
PURIFIED
WATER 1.0
AFTER
REVOLUTION
STARTS
FINAL
POLISHING
PR5X-500-80 XF5D
(7)
PURIFIED
WATER 1.0
AFTER
REVOLUTION
STARTS
Note: All polishing times will be half of the above when the number of attached ferrules is 5
or less.

SFP-550 Polishing Process Manual
FP-PM55 (Rev. 6.3)
7/20
§4 D 1.25mm Ferrule, HPC Convex Polishing
Polishing Holder (Standard IPC Holder):
PH55-FLM-24 (LC / MU Ferrule, Coupling nut type)
PH55-FLM-16 (LC / MU Ferrule, Post-type)
PH55-PL-24 (LC Plug)
PH55-PM-24 (MU Plug)
POLISHING CONDITION
POLISHING
PROCESS POLISHING PAD
POLISHING
FILM
(service life)
POLISHING
LIQUID
POLISHING
TIME (min.) PRESSURE
ADHESIVE
REMOVAL PR5X-500-90 GA5D (5) NONE 0.5 NONE
FIRST
POLISHING
PR5X-500-85 DH5D-3μ
(30)
PURIFIED
WATER 1.0
AFTER
REVOLUTION
STARTS
SECOND
POLISHING
PR5X-500-85 DJ5D-1μ
(30)
PURIFIED
WATER 1.0
AFTER
REVOLUTION
STARTS
FINAL
POLISHING
PR5X-500-85 XF5D
(10)
PURIFIED
WATER 1.0
AFTER
REVOLUTION
STARTS
Note: All polishing times will be half of the above when the number of attached ferrules is 5
or less.

SFP-550 Polishing Process Manual
FP-PM55 (Rev. 6.3)
8/20
§5 D 2.5mm Ferrule APC Polishing (w/o Tuning)
Polishing Holder (Standard IPC Holder):
Connector
Type APC Type Pedestal Diameter Key Width Chamfer Angle
PH55-FF8A-18-1.3 APC Ferrule Step 1.4mm 1.3mm ---
PH55-FF8A-18-1.5 APC Ferrule Step 1.4mm 1.5mm ---
PH55-FF8C-18-1.3 APC Ferrule Conical 1.0mm 1.3mm 35 degree
PH55-FF8C-18-1.5 APC Ferrule Conical 1.0mm 1.5mm 35 degree
PH55-FP8R-18-I FC/APC Step 1.4mm 2.00mm ---
PH55-FP8N-18-I FC/APC Step 1.4mm 2.14mm ---
PH55-FP8RC-18-I FC/APC Conical 1.0mm 2.00mm 35 degree
PH55-FP8NC-18-I FC/APC Conical 1.0mm 2.14mm 35 degree
PH55-CP8A-18 SC/APC Step 1.4mm --- ---
PH55-CP8C-18 SC/APC Conical 1.0mm --- 35 degree
POLISHING CONDITION
POLISHING
PROCESS
POLISHING PAD
POLISHING
FILM
(service life)
POLISHING
LIQUID
POLISHING
TIME (min.)
PRESSURE
ADHESIVE
REMOVAL
CONVEX
FORMING
PR5X-500-75 GA5D
(1)
PURIFIED
WATER 1.0
AFTER 10
TURNTABLE
REVOLUTIONS
FIRST
POLISHING
PR5X-500-75 DA5D
(30)
PURIFIED
WATER
1.0 to 1.5
(Note 1)
AFTER
REVOLUTION
STARTS
SECOND
POLISHING
PR5X-500-75 DR5D-9μ
(30)
PURIFIED
WATER 1.0
AFTER
REVOLUTION
STARTS
THIRD
POLISHING
PR5X-500-75 DJ5D-1μ
(30)
PURIFIED
WATER 1.0
AFTER
REVOLUTION
STARTS
FINAL
POLISHING
PR5X-500-75 XF5D
(10)
PURIFIED
WATER 1.0
AFTER
REVOLUTION
STARTS
Note 1: Polishing time for DA5D is 1.0 min. up to 15 times and 1.5 min. after 15 times
Note 2: All polishing times will be half of the above when the number of attached ferrule
is 5 or less.
Note 3: For conical ferrule, the above holders might cause apex offset depending on
conical ferrule tip dimension. Then you need to have custom design holder as
per ferrule tip dimension.

SFP-550 Polishing Process Manual
FP-PM55 (Rev. 6.3)
9/20
§6 LC / MU Plug APC Polishing (w/o Tuning)
Polishing Holder (Standard IPC Holder):
PH55-PL8A-20 (LC/APC Plug)
PH55-PM8A-20 (MU/APC Plug)
APC POLISHING CONDITION
POLISHING
PROCESS
POLISHING PAD
POLISHING
FILM
(service life)
POLISHING
LIQUID
POLISHING
TIME (min）
PRESSURE
ADHESIVE
REMOVAL
CONVEX
FORMING
PR5X-500-70 DA5D
(30)
PURIFIED
WATER
0.5 to 1.0
(Note 1)
AFTER 20
TURNTABLE
REVOLUTIONS
FIRST
POLISHING
PR5X-500-70 DR5D-9μ
(30)
PURIFIED
WATER 0.5
AFTER
REVOLUTION
STARTS
SECOND
POLISHING
PR5X-500-70 DJ5D-1μ
(30)
PURIFIED
WATER 1.0
AFTER
REVOLUTION
STARTS
FINAL
POLISHING
PR5X-500-70 XF5D
(10)
PURIFIED
WATER 1.0
AFTER
REVOLUTION
STARTS
Note 1: Continue polishing until convex is completely formed
Note 2: All polishing times will be half of the above when the number of attached ferrules
is 5 or less.

SFP-550 Polishing Process Manual
FP-PM55 (Rev. 6.3)
10/20
Polishing Process for Mega-axis Holder

SFP-550 Polishing Process Manual
FP-PM55 (Rev. 6.3)
11/20
§7 Instruction of Mega-axis IPC Holder
Please make sure that Zr ferrule does not have any epoxy or debris on side
face. These epoxy or debris may affect polishing performance because of
changing spring pressure from IPC (Independent Pressure Control) system.
In addition, to clean ferrule insertion hole is necessary as regular
maintenance to avoid debris to stick inside the hole. Please use HCB-250
(for 2.5mm hole) or HCB-125 (for 1.25mm hole) brush with IPA for cleaning.
After brushing, brow compressed air to the cleaned insertion hole.
Pic. 1 Pic. 2
Pic. 3

SFP-550 Polishing Process Manual
FP-PM55 (Rev. 6.3)
12/20
§8 D 2.5mm Pre-radius Ferrule, HPC Convex Polishing
Polishing Holder (Mega-axis IPC Holder):
PH55-FF-40N (D 2.5mm Ferrule)
PH55-CP-32N (SC Plug)
PH55-SP-28N (ST Plug)
POLISHING CONDITIONS
POLISHING
PROCESS POLISHING PAD
POLISHING
FILM
(service life)
POLISHIN
G LIQUID
POLISHING
TIME (min) PRESSURE
ADHESIVE
REMOVAL PS5X-500-00 GA5D (5) NONE 0.5 NONE
FIRST
POLISHING
PR5X-500-75 DR5D-9u
(30)
PURIFIED
WATER 0.5
AFTER 10
TURNTABLE
REVOLUTION
SECOND
POLISHING
PR5X-500-75 DJ5D-1u
(15)
PURIFIED
WATER 1.0
AFTER
REVOLUTION
STARTS
FINAL
POLISHING
PR5X-500-75 XF5D
(5)
PURIFIED
WATER 1.0
AFTER
REVOLUTION
STARTS
Note: All polishing times will be half of the above when the number of attached ferrules is
5 or less.

SFP-550 Polishing Process Manual
FP-PM55 (Rev. 6.3)
13/20
§9 D 1.25mm Ferrule, HPC Convex Polishing
Polishing Holder (Mega-axis IPC Holder):
PH55-PL-40N (LC Plug)
PH55-PM-40N (MU Plug)
PH55-FLM-40N (LC / MU Ferrule) *
*Note: For LC ferrule polishing, please insert 4pcs of 0.6mm spacers between
the holder plate and the spring plate. The spacers come with the holder.
POLISHING CONDITION
POLISHING
PROCESS POLISHING PAD
POLISHING
FILM
(service life)
POLISHING
LIQUID
POLISHING
TIME (min.) PRESSURE
ADHESIVE
REMOVAL PR5X-500-90 GA5D (5) NONE 0.5 NONE
FIRST
POLISHING
PR5X-500-85 DH5D-3μ
(20)
PURIFIED
WATER 1.0
AFTER
REVOLUTIONS
STARTS
SECOND
POLISHING
PR5X-500-85 DJ5D-1μ
(20)
PURIFIED
WATER 1.0
AFTER
REVOLUTION
STARTS
FINAL
POLISHING
PR5X-500-85 XF5D
(5)
PURIFIED
WATER 1.0
AFTER
REVOLUTION
STARTS
Note: All polishing times will be half of the above when the number of attached ferrules is
5 or less.

SFP-550 Polishing Process Manual
FP-PM55 (Rev. 6.3)
14/20
§10 SC Plug APC Polishing (w/o Tuning)
Polishing Holder (Mega-axis IPC Holder)：
PH55-CP8A-32N (SC/APC Plug with Step ferrule, Pedestal D 1.4mm)
PH55-CP8C-32N (SC/APC Plug with Conical ferrule, Pedestal D 1.0mm,
Chamfer angle 35-deg)
PH55-FF8C-40N-1.3 (Conical ferrule 8-deg APC, Pedestal D 1.0mm,
Chamfer angle 35-deg, Key width 1.3mm)
POLISHING CONDITION
POLISHING
PROCESS
POLISHING PAD
POLISHING
FILM (service
life)
POLISHING
LIQUID
POLISHING
TIME (min.)
PRESSURE
ADHESIVE
REMOVAL
CONVEX
FORMING
PR5X-500-75 GA5D
(1)
PURIFIED
WATER 1.0
AFTER 10
TURNTABLE
REVOLUTIONS
FIRST
POLISHING
PR5X-500-75 DA5D
(30)
PURIFIED
WATER
1.0 to 1.5
(Note 1)
AFTER
REVOLUTION
STARTS
SECOND
POLISHING
PR5X-500-75 DR5D-9μ
(30)
PURIFIED
WATER 1.0
AFTER
REVOLUTION
STARTS
THIRD
POLISHING
PR5X-500-75 DJ5D-1μ
(15)
PURIFIED
WATER 1.0
AFTER
REVOLUTION
STARTS
FINAL
POLISHING
PR5X-500-75 XF5D
(5)
PURIFIED
WATER 1.0
AFTER
REVOLUTION
STARTS
Note 1: Polishing time for DA5D is 1.0 min. up to 15 times and 1.5 min. after 15 times
Note 2: All polishing times will be half of the above when the number of attached ferrules
is 5 or less.
Note 3: For conical ferrule, the above holders might cause apex offset depending on
conical ferrule tip dimension. Then you need to have custom design holder as
per ferrule tip dimension.

SFP-550 Polishing Process Manual
FP-PM55 (Rev. 6.3)
15/20
§11 LC Plug APC Polishing (w/o Tuning)
Polishing Holder (Mega-axis IPC Holder):
PH55-PL8A-40N (LC/APC Plug)
APC POLISHING CONDITION
POLISHING
PROCESS
POLISHING PAD
POLISHING
FILM
(service life)
POLISHING
LIQUID
POLISHING
TIME (min）
PRESSURE
ADHESIVE
REMOVAL
CONVEX
FORMING
PR5X-500-70 DA5D
(30)
PURIFIED
WATER
0.5 to 1.0
(Note 1)
AFTER 20
TURNTABLE
REVOLUTIONS
FIRST
POLISHING
PR5X-500-70 DR5D-9μ
(30)
PURIFIED
WATER 0.5
AFTER
REVOLUTION
STARTS
SECOND
POLISHING
PR5X-500-70 DJ5D-1μ
(15)
PURIFIED
WATER 1.0
AFTER
REVOLUTION
STARTS
FINAL
POLISHING
PR5X-500-70 XF5D
(5)
PURIFIED
WATER 1.0
AFTER
REVOLUTION
STARTS
Note 1: Continue polishing until convex is completely formed.
Note 2: All polishing times will be half of the above when the number of attached ferrules is
5 or less.

SFP-550 Polishing Process Manual
FP-PM55 (Rev. 6.3)
16/20
§12 Service Life of Polishing Films
Polishing Films Application Service Life
(Usable
times)
Polishing
Material
Diameter
of polishing
particles
GA5D Adhesive Removal,
Rough Polishing 1-5
GC5D Adhesive Removal,
First Polishing 1
GI5D Second Polishing 1
GK5D Second Polishing 1
S i C
Large
│
│
│
│
↓
Small
DA5D Rough Polishing 15-30
DR5D-9μ First Polishing 15-30
DG5D-5μ First Polishing 15-30
DH5D-3μ Second Polishing 15-30
DJ5D-1.5μ Second Polishing 15-30
Diamond
Large
│
│
│
│
↓
Small
AR5D First Polishing 1
AJ5D Second Polishing 1
SF5D Final Polishing 1
AO5D Final Polishing 1
Alumina
Large
│
│
│
↓
Small
XF5D Final Polishing 5-10 SiO2 Fine
EF5D Final Polishing 1 CeO2 Fine
CF5D Cleaning 30
BX5D Polishing 3 Polishing Pad
Note 1: Service life of films may change depending on conditions of storage or usage
Note 2: Wipe and clean the polishing films to remove polishing remaining and
moisture after polishing and storage them in low humidity condition.

SFP-550 Polishing Process Manual
FP-PM55 (Rev. 6.3)
17/20
§13 Polishing Process
Polishing process is depending on each ferrule shape, material, and connector type.
Polish ferrules by an appropriate polishing condition described in the former sections.
The following Polishing Process is regarding to general ferrule polishing using SFP-550S
13.1 Ferrule Mounting Check
When ferrules are mounted to the polishing holder, please make sure that the tip of
ferrules protrude uniformly from the bottom of the holder.
A variety of the protrusions influence the quality of
polishing. Confirm the protrusion of the ferrules
after mounting, remove the ferrule if its protrusion
length is larger or shorter than others. Especially
the ferrule of short protrusion may not be mounted
completely because of adhesive on the side of the
ferrule. Clean the ferrule well and mount it to the
holder again. Do not remove the ferrules during
polishing processes.

SFP-550 Polishing Process Manual
FP-PM55 (Rev. 6.3)
18/20
13.2 Adhesive Removal Process
Use of sponge pad in adhesive removal step helps reducing fiber crack and damages in
polishing film. Adhesive removal process shall be done until adhesive is completely
removed. If there is adhesive left on ferrule endface, it might lead to polishing film
breakage or affect to polished endface geometry.
Pic. 10 Fiber crack
Example: amount of adhesive
Pic. 11 Not enough Pic. 12 Decent amount Pic. 13: Too much

SFP-550 Polishing Process Manual
FP-PM55 (Rev. 6.3)
19/20
13.3 Cleaning of Polishing Holder
Polishing particles stuck to the polishing holder at the former polishing step may be a
cause for the damage of a polishing film and scratches of the ferrule tip at the latter
polishing step. After every polishing step, wipe the bottom side of the polishing holder,
especially the area around the ferrule tips shown the shaded part in the bottom figure, by
PURIFIED WATER and lint-free tissue.
13.4 Cleaning of Polishing Film and Polishing Pad
For polishing film, which has service life more than once, shall be wiped and cleaned
by purified water and lint-free tissue after every use. Because remain of polished
residue may cause bad polishing result. Also, when polishing liquid between the
polishing pad and the film is found, clean the area between the polishing pad and film
and keep the area free from the extraneous materials. Because polishing liquid
between the polishing pad and the polishing film may accelerate the polishing film
peeling and be cause for the bad polishing result or damage of the polishing film.
The following figure shows the area focusing on cleaning.
ＤＭ
ＤＲ