Plasma 703-1-0 User manual

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ION BEAM RF SOURCES
MANUAL
ESTABLISHED 2003

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Thank you for purchasing an ion beam source from Plasma Process Group! We want your new source to operate
safely. Anyone who installs or operates this equipment should read this publication (and any other manuals)
before installing or using the ion beam source, neutralizer and power supply.
All applicable local and national codes that regulate the installation and operation of this electronic equipment
should be followed. It is your responsibility to determine the codes that apply to your area.
Please follow all applicable sections of the National Fire Code, National Electronic Code, and the codes of the
National Electrical Manufacturer’s Association (NEMA). Consult with your local government to help determine
which codes are necessary for safe installation. Failure to comply with applicable codes and standards may
result in equipment damage or serious injury to personnel.
Our equipment is designed for laboratory or production vacuum environments. The external interlock for the
ion beam source power supply should be connected to your facility to ensure maximum safety and prohibit
usage of the equipment when unsafe conditions arise. Failure to use the external interlock is considered “High
Risk Activities” where personal injury or equipment damage may result. Plasma Process Group specically
disclaims any expressed or implied warranty for High Risk Activities.
The ion beam power supply has been CE certied and the electronic discharges for the source and neutralizer
are created using industry standard radio frequency (RF) methods. Improper installation of this equipment may
result in disruptions with other sensitive electronic equipment.
If you have any questions regarding the installation and operation of this equipment, please contact us immediately at
970-663-6988 or [email protected].
We at Plasma Process Group hope that using your new ion beam source will produce rewarding results.
Copyright © 2019 by Plasma Process Group, Inc. All rights reserved.
7330 Greendale Road, Windsor, CO 80550 USA
Phone [phone] • Fax [phone]
No part of this publication may be reproduced without prior written permission
Date: October 2019 REV P1
Safety
WARNING
HAZARDOUS VOLTAGE – ion beam sources are to be serviced
and operated by trained personnel only.

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For Service or Repair please contact us at 970-663-6988 or send an email to [email protected].
Before contacting us please have ready the following information about the issue:
Many issues can be solved over the phone or email.
In the event hardware needs to be returned, all equipment, including warranty, returned to Plasma Process
Group (PPG) requires a return authorization (RA) number. Our support team will provide a return request form
with instructions to start the process. This form is also located at our website plasmaprocessgroup.com (see
Resources then Terms and Forms). Special instructions will apply to international customers.
Our workmanship warranty can be found at our website plasmaprocessgroup.com (see Resources then Terms
and Forms).
Service and Technical Support
• Product type
• Model and serial number
• Date purchased
• List of all the operating parameters
• Error messages on power supply
• Gas ow to the source, neutralizer and background
• Chamber pressure
Warranty

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This manual uses these symbols to indicate potential hazards.
ALERT - This symbol is used for tips and other pointers.
Warning Statements
Warning- Risk of Injury to Persons
is symbol is used to warn of a heavy li operation.
CAUTION
This symbol is used to alert of a potential risk to person or equip-
ment.
WARNING
This symbol illustrates a electrical shock hazard.

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Table of Contents
Chapter 1: Getting Started 6
Section 1.1: Terminology 6
Section 1.2: Overview 8
Chapter 2: Installation 11
Section 2.1: General Requirements 11
Section 2.2: Layout 12
Section 2.3: Unpacking 13
Section 2.4: Source Installation 14
Chapter 3: Specications 18
Section 3.1: Specications for RF Neutralizer (RFN) 18
Section 3.2: Specications for 6 cm RF 19
Section 3.3: Specications for 12 cm RF 20
Section 3.4: Specications for 16 cm RF 21
Section 3.5: Specications for 23 cm RF 22
Section 3.6: Specications for Linear RF 23
Section 3.7: Power Supply Specications 24
Chapter 4: Operation 25
Section 4.1: Quick Start Sequence 25
Section 4.2: Additional Resources 29
Chapter 5: Advanced Operation 30
Section 5.1: Grid Theory 30
Section 5.2: Source Ignition 36
Section 5.3: Source Ignition Sequence 38
Section 5.4: Technical Tips 39
Chapter 6: Maintenance 42
Section 6.1: Maintenance Work Station 42
Section 6.2: Schedule 43
Section 6.3: Common Wear and Tear 44
Section 6.4: Recommended Spare Parts 45
Chapter 7: Troubleshooting 46
Section 7.1: Common Issues and Quick Fixes 47
Section 7.2: Power Supply Error Codes 48
Section 7.3: RF Neutralizer (RFN) Errors 51
Section 7.4: Starting the Source 53
Section 7.5: Turning on the Beam 54
Section 7.6: Additional Resources 55
Chapter 8: Parts and Drawings 56
Section 8.1: Navigating Grid Assembly Drawings 56
Section 8.2: Part Numbers for RFN 57
Section 8.3: Part Numbers for 6 cm RF Source 58
Section 8.4: Part Numbers for 12 cm RF Source 61
Section 8.5: Part Numbers for 16 cm RF Source 64
Section 8.6: Part Numbers for 23 cm RF Source 69
Section 8.7: Part Numbers for 6x22 cm RF Source 72
Section 8.8: Part Numbers for 6x30 cm RF Source 73
Appendix A: Cleaning Guide 75
Section A.1: Molybdenum Grid Cleaning Procedure 75
Section A.2: Reassemble 78
Section A.3: Electrical Testing 82

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Ion beam technology was developed at NASA in the 1960s as a means of producing thrust on
spacecraft. Today, ion beam sources are used on vacuum systems for depositing precise thin lm
coatings of oxides, diamond-like carbon, and other useful materials on optical and mechanical
components.
This manual covers the installation and operation of radio frequency (RF) ion beam source
products we oer.
Section 1.1: Terminology
The function of an ion beam source is to produce ions
and accelerate these ions to high velocities so they
are ejected downstream from the source. The ejected
ions are directed to form a “beam” in which they all
have the same energy and can be directed to a target
or other substrate. At low energies, the ion beam is
useful for etching or cleaning parts. At high energies,
the ion beam can be used to sputter target materials.
An RF ion source package consists of the ion beam
source, an RF neutralizer (RFN), feedthroughs, power
supply(s), RF matching network, and cables. To install
the source in a vacuum system, feedthroughs are
used and these combined with additional hardware
form an interface kit.
Chapter 1: Getting Started
Ion beam striking a target.
The hardware unpacked.
ION BEAM RF SOURCES MANUAL

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ION BEAM RF SOURCES MANUAL Chapter 1: Getting Started
Depending upon the conguration, the source
may already be attached to the interface kit. This
is common for ange mounted sources. For these
cases, the matching network is also attached and the
entire assembly just requires installation. Internal
mount kits will come with individual feedthroughs
that require installation into the vacuum system
before the source can be attached.
Inside the source are the key elements for operation.
These include the gas inlet (also called gas isolator),
the RF antenna (also called coil), discharge chamber
and grids. Process gas, such as high purity Argon,
is fed into the discharge chamber. The RF antenna
will then excite free electrons causing ionization of
the process gas. A plasma is then created inside
the discharge chamber. A plasma is an electrically
conductive gas where the density of ions and
electrons are approximately equal.
All RF ion beam sources will have these same key
elements. Only the sizes and geometries will dier
for antennas, grids, and discharge chambers.
Source and interface kit assembly
Inside the source
The RF ion beam source family.

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ION BEAM RF SOURCES MANUAL Chapter 1: Getting Started
ION BEAM PARAMETERS
PARAMETER DEFINITION UNIT
Source Gas Flow Process gas delivered to the discharge chamber. sccm
RF Forward Power The RF power applied to the matching network. This controls the
ion production rate W
RF Reected Power The RF power returned from the matching network. W
Beam Voltage Positive voltage applied to the screen grid (ion energy). V
Beam Current The total ion current leaving the source. mA
Accel Voltage Negative voltage applied to the accelerator grid. V
Accel Current Current collected by accelerator grid (charge-exchange). mA
A/B Ratio Ratio of accel to beam current. Typical A/B is < 10%. %
Section 1.2: Overview
The schematic below illustrates how the key elements work inside the source. Process gas is supplied to
the discharge chamber. The RF antenna is tuned using the matching network where its voltages can reach
upwards of ±2500 V. The oscillating eld will excite free electrons that can ionize the process gas and sustain
a plasma discharge (ions and electrons). Ions created in the discharge chamber that drift towards the grids
are then accelerated to high velocities with electrostatic potential applied to the grids. The screen grid is
biased positive, the accelerator grid is biased negative and the decelerator grid is grounded.
Electrical schematic for the RF ion beam source

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ION BEAM RF SOURCES MANUAL Chapter 1: Getting Started
The grids, which control the ion optics, will come in
dierent shapes, sizes and materials. They can be
at (i.e. graphite) or dished (i.e. molybdenum) to
promote beam shape and trajectories. The inner
most grid is called the screen grid (biased positive)
and the middle grid is called the accelerator (biased
negative). Most grid assemblies will have 3 grids
where the decelerator will act as a shield to the other
two grids and capture process material coming back
to the source. Additional information about the grid
operation and design can be found in Chapter 5.
A neutralizer is placed downstream from the source
where it emits electrons to balance the number
of positive ions which leave the source. The RFN
operates in a similar fashion to the source as it
requires process gas, has an RF antenna and its own
matching network. Please refer to its manual for a
detailed description of its operation and additional
information.
The RFN needs to be placed so that its electrons can
couple (or “see”) the ion beam. It is very important
that these electrons have a close (about 150 mm),
unobstructed path to the beam to ensure stable,
noise free operation. The RFN should also be located
away from strong magnets or shielded from magnetic
elds using 400 series stainless steel. A common
challenge will be to protect the RFN from process
material that can coat its keeper - but allow for
electrons to couple.
Electrons from the neutralizer do not recombine
with source ions, rather they provide space-charge-
neutralization for the downstream plasma. Under
normal operation, the neutralizer will emit between
125% to 200% of the measured beam current. In this
fashion substrates or targets downstream will not
suer damage due to arcing or surface charging.
Typical grids before assembly
Place the RFN in close proximity to the ion beam
The RFN will emit more electrons than ions from
the source

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ION BEAM RF SOURCES MANUAL Chapter 1: Getting Started
The source and RFN are both controlled using
the I-BEAM power supply. The I-BEAM supply is
connected to the source, RFN and it will monitor the
source matching network controller. There are three
modes of control. These are “Manual” which provides
full RF control, “Local” which allows direct beam
current control, and “Remote” for system interface.
Please refer to its manual for a complete description
and additional information. Specics on the power
supply operational features will be discussed in
Chapters 4 and 5 of this manual. Chapter 5 also has
tech tips for the source, RFN, and I-BEAM.
The table below are the critical operating parameters
for the RFN. The I-BEAM ion source controller
NEUTRALIZER PARAMETERS
PARAMETER DEFINITION UNIT
RFN Gas Flow Gas delivered to the neutralizer. sccm
RFN Forward Power The RF power applied to the matching network. W
RFN Reected Power The RF power reected from the matching network. W
Keeper Current Discharge current between keeper and collector. Typical is
300 mA. mA
Keeper Voltage Voltage applied to keeper. Lower than 30 V is preferred. V
Neutralizer Emission
Current The electron current emitted by the neutralizer. mA
E/B Ratio Ratio of neutralizer emission to beam current. Typical E/B
is 125% or greater to minimize surface charging and arcing. %

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Please contact us with any concerns or issues that arise during the installation of the source. Each source and
vacuum system are unique and present challenges.
Section 2.1: General Requirements
Vacuum system
The source will require a modest vacuum system capable of handling some gas ow. Typical pumping stations
will have either a diusion or cryo high vacuum pump. The pumping speed must be appropriate for the ion
source selected which will fall within a range from 1500 to 6000 L/s air. The base pressure for the machine
should be low 10-6 mbar and even a lower water vapor pressure. With the source, RFN and process gases the
chamber pressure should not exceed 5x10-4 mbar during operation.
Gas supply
The source and RFN require accurate and stable ow. We recommend and use Alicat™ mass ow controllers
(MFC) or equivalent. Mass ow control should be accurate to .1 sccm levels. The RFN does require high purity
(5N) Argon and can be operated on Xenon if necessary. The source also uses high purity Argon, but will operate
using Oxygen or Nitrogen. Please give us a call if you have specic questions about the gas type.
The gas bottle should have a 2 stage regulator to provide minimal pressure uctuations. The facilities should
run electropolished stainless steel gas lines between the bottle and MFC and between the MFC and source (or
RFN).
Cooling
The RF sources will require water cooling for the RF antenna. This promotes RF power stability. Some of the
RF sources also have a water cooled shroud. Treated drinking water at 25°C and no more that 300 kPa (50 psi)
is recommended. Care should be taken for recirculating systems with additives that may change the electrical
conductivity of the water as RF power is susceptible to these coolants. The water should be pH neutral and
deionized water should be avoided. The typical ow rate for the source and shroud will be 1 L/min and the
water manifold should have a ow interlock.
Electrical
The vacuum system should have an earth ground. A grounding line should be installed between the I-BEAM and
the vacuum chamber earth ground. The I-BEAM supply requires 208 VAC, 50/60 Hz single phase at 16A. The
matching network controller will require 110 VAC, 50/60 Hz. Cables between the I-BEAM supply and source (or
RFN) should be fully seated. Remaining cable should be looped and secured with tie wraps. The I-BEAM supply
and matching network controller need to be mounted to the well ventilated 19” rack. Additional installation
information is provided in the I-BEAM manual.
Chapter 2: Installation
ION BEAM RF SOURCES MANUAL

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ION BEAM RF SOURCES MANUAL CHAPTER 2: Installation
Safety
The I-BEAM power supply has a switch closure interlock that needs to be interfaced with the facilities. Industry
standard is to safe guard the power supply and only allow for the source to be run when the vacuum pumping
station is ready, gas and coolant ows are nominal. All facilities should have an emergency power o (EPO)
switch that will break the interlock and turn power o to the supply.
Source locations for a Ion Beam Assisted Deposition
tool.
Section 2.2: Layout
When installing a source, careful consideration must
be given to the nal geometry. A starting point is
to dene where the ion beam is needed and work
backwards from there. Source to target distance is
important for sputtering applications where source to
substrate distance is important for assist applications.
All ion beams will spread out downstream and
the source grid design will control the degree of
focus. Beam over-spray should also be considered
when designing a system. In the Learning Center
of our website we have beam coverage diagrams.
These illustrate how the beam shape is changing
downstream with dierent sources and grid
assemblies.
Ion Current Density
For some applications, it can be useful to determine
the expected ion current density distribution on the
target or substrate. We have a calculator on our
website in the Learning Center that estimates beam
cross section current density at dierent distances
downstream.
Neutralizer
The neutralizer should be placed in close proximity
to the grids on the source. This helps the electrons
couple to the beam and minimizes emission noise
and arcing issues.
Consultation
Please reach out to us for assistance with your system
needs. There are a few guides in the Learning Center
of our website that assist with the design process, but
we are here to make sure your project is successful
and your machine is protable.
Source installation in a evaporator coating system

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ION BEAM RF SOURCES MANUAL CHAPTER 2: Installation
Section 2.3: Unpacking
We take extra care in packaging our equipment for shipment. Please inspect all containers for any shipping
damage. Send us a photo of the shipping container if there are any issues. Handle all equipment with care.
Personal protection
Eye protection should always be worn. All equipment should be handled with clean room grade Nitrile™ or
Latex™ gloves.
It is recommended to stage the installation away from the shipping container. Care should be taken to minimize
particulate contamination such as hair and dust while the source is being assembled and installed.
Source and RFN
All the ion beam source and sub-assemblies have been rigorously cleaned. Common vacuum practice is
recommended while handling the source components. This requires that the operator use latex or non-latex
type gloves to prevent nger oil from contaminating the surfaces of the ion source. Some of the items will
be wrapped in vacuum grade aluminum foil for shipment protection. Remove all foil and other plastic bag
materials.
Power Supply
The I-BEAM supply should be unpacked on a cart and should be lifted with 2 people. The matching network
controller should also be located and unpacked. All of the cables can be removed from their plastic bags.
Extras
For complete source packages we will also include a spare set of tools, an alignment jig for the grid assembly,
and a spare parts kit.
Warning- Lift hazard
Best practice is to have 2 people li the source and power supply.

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Section 2.4: Source Installation
The installation of a ange mount or extension mount source styles are straightforward, as the source body
is mounted to the vacuum ange. An internal mount source diers from the ange mount sources in a few
respects; feedthroughs come in diverse sizes, the matching network has to be creatively mounted if smaller
feedthroughs are used, and there are more connections involved.
The internal mount source allows the user to aim the source in a specic direction. The ange mount source
bolts directly to a vacuum system and its orientation cannot be adjusted.
Internal and Flange mount
Step 1: Vent the system. Remove the ange to be replaced by the ange mount source or remove the feed-
through blanks to be replaced by the feedthroughs for the internal mount source.
Step 2: Prepare the anges and feedthroughs. Wipe all debris from open port on the vacuum system. For o-ring
type, apply a thin coating of vacuum grease to the supplied o-ring, and install the o-ring on the chamber
orice. For metal seal type, clean and install the metal gasket.
Flange mount
Step 3A: Use appropriate lift assistance to pilot the source assembly into position on the chamber.
The assembly is quite heavy. Make sure the o-ring or gasket retains its position.
Step 3B: Bolt it to the chamber gradually, using a star pattern and tightening each bolt, each pass. Install the
high voltage cover when nished.
ION BEAM RF SOURCES MANUAL CHAPTER 2: Installation
Flange mount - 16 cm source on 16.5” conat ange Internal mount - 16 cm source with 2.75” anges
TIP: Install the source rst - then the grid assembly. Consult our website for assembly drawings
and videos pertaining to the installation of the source grid assembly and discharge chamber.
TIP: Please consult the I-BEAM power supply manual for its proper installation. Our website also
has a power supply installation video.
TIP:Please consult the RFN manual for its proper installation.

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ION BEAM RF SOURCES MANUAL Chapter 2: Installation
Internal mount
Step 3A: Place the source body inside the chamber and position it to line up with the feed-through connections.
Secure it loosely for now.
Step 3B: Connect the gas line from the feed-through to the source.
Step 3C: Connect the DC power leads from the feed-through to the source.
Step 3D: Connect the antenna feed-through to the antenna inside the source body.
Attach discharge chamber
Internal and Flange mount
Step 4: Prepare the grid assembly for installation
by rst removing the clamp ring. Install the quartz
discharge chamber onto the grid assembly. The dis-
charge chamber should have some movement free-
dom when installed properly. Be careful - the quartz
discharge chamber is fragile!
Step 5: Mount the grid assembly to the source by
lining up the spring tabs between the source and grid
assembly rst. Then slowly insert the gas isolator into
the discharge chamber. Secure nger tight using a
star pattern.
Align grids with spring tabs and install gently.

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ION BEAM RF SOURCES MANUAL Chapter 2: Installation
Internal mount
Step 7A: Mount the RF matching network to your chamber and connect it to the antenna feed-through.
Step 7B: Install the high voltage covers over the antenna connections and the DC feedthrough.
Step 7C: Connect a cooling water supply to one end of the supplied 7-foot antenna poly tubes. Connect the
other 7-foot poly tube from the other antenna connection to one end of the shroud water feedthrough.
Connect the drain line to the other shroud water connection. The source shroud and antenna will now
be cooled in series.
Flange mount
Step 7: Connect a water supply and drain line to the respective In and Out water connections on the ange feed-
throughs.
Internal and Flange mount
Step 8: Connect the gas supply line from the mass ow controller to the source.
Step 9: Install the RFN and its matching network to the desired vacuum port. Connect its gas line from the mass
ow controller.
Step 10: Connect the RF cables from the source and RFN to their appropriate connectors on the power supply.
The red-colored RF cable is for the source connection, the blue colored cable is for the RFN connection.
NOTE: Incorrect connections can damage the ion source.
Step 6: It is good practice to ensure the spring tabs
are connected. For sources with molybdenum
grids, perform a continuity test between the pins of
the feed-through and each grid. Use a multimeter
(preferably with an audible continuity test tone) with
a ne wire probe. Do NOT perform this test with
graphite grids as they are fragile.
Continuity at the feedthrough should be as follows:
o Feedthrough Pin A to Accel grid (and not
conductive to Ground or other pins)
o Feedthrough Pin B to Screen grid (and not
conductive to Ground or other pins)
o Feedthrough Pins C & D to Decel grid (and should
be to Ground only)
Checking electrical continuity on molybdenum grids.

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ION BEAM RF SOURCES MANUAL Chapter 2: Installation
Step 11:
Step 12:
Step 13:
Step 14:
Step 15:
Follow the I-BEAM power supply manual to complete installation of the power supply and its connec-
tions. Connect the interlocks as required.
Pump down the vacuum chamber. Leak check all vacuum ports that have been aected.
Slowly open the coolant water valve. Watch for a rise in chamber pressure from an internal leak, and
look for any external leaks (potentially introduced during shipping).
Check proper operation of the gas supply to the source and RFN.
The source should now be ready for operation. If you are unsure of any item, please contact us for
assistance.

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Each ion beam source will have a range of operating conditions that it can achieve under typical running
conditions. The data in this chapter are typical and have been optimized for proper operation. Critical
parameters for the source will be the beam current (number of ions leaving the source), beam voltage (ion
energy) and accelerator voltage. The maximum beam current will vary with beam voltage. Grid material may
play a role in the process and please consult our Grid Selection Guide on-line or call for assistance.
Section 3.1: Specications for RF Neutralizer (RFN)
ION BEAM RF SOURCES MANUAL
Chapter 3: Specifications
SPECIFICATIONS
SOURCE BEAM CURRENT BEAM VOLTAGE GRIDS COOLING
6 cm 25 - 200 mA 50 - 1500 V molybdenum or graphite antenna
12 cm 50 - 400 mA 50 - 1500 V molybdenum or graphite antenna and shroud
16 cm 100 - 1000 mA 100 - 1500 V molybdenum or graphite antenna and shroud
23 cm 200 - 1500 mA 100 - 1250 V molybdenum antenna
6 x 22 cm 50 - 500 mA 50 - 1500 V molybdenum antenna
6 x 30 cm 50 - 500 mA 50 - 1500 V graphite antenna
Dimensions and weight: 4.4 kgRFN and match network on a 6" CF ange
NOMINAL PERFORMANCE DATA - USING ARGON @ 5 SCCM
NEUTRALIZER RF POWER KEEPER
Emission (mA) Forward (W) Reected (W) Voltage (V) Current (mA)
100 40 0 24 300
500 50 0 25 300
900 60 0 22 300
1500 90 2 40 200
1750 90 2 45 200
500 idle 65 warm up 1 27 300

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Section 3.2: Specications for 6 cm RF
ION BEAM RF SOURCES MANUAL CHAPTER 3: Specications
Dimensions and weight: 3.6kg6 cm RF ion beam source
NOMINAL PERFORMANCE DATA - USING ARGON @ 8 SCCM
BEAM ACCELERATOR RF POWER NEUTRALIZER
Voltage (V) Current (mA) Voltage (V) Current (mA) Forward (W) Reected (W) Emission (mA)
100 100 500 14 258 1 150
250 100 350 14 256 0 150
500 150 300 12 373 1 225
1000 200 250 2 446 2 300
1250 200 150 2 412 2 300
1500 200 150 2 391 2 300
100-1500 50 oor 100 ~1 ~80 1 75
50 idle ~50 typical 150 idle 500

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Section 3.3: Specications for 12 cm RF
ION BEAM RF SOURCES MANUAL CHAPTER 3: Specications
Dimensions and weight: 6.8 kg12 cm RF ion beam source
NOMINAL PERFORMANCE DATA - USING ARGON @ 10 SCCM
BEAM ACCELERATOR RF POWER NEUTRALIZER
Voltage (V) Current (mA) Voltage (V) Current (mA) Forward (W) Reected (W) Emission (mA)
250 150 300 3 143 0 225
500 150 300 4 139 0 225
750 200 250 5 163 0 300
1000 400 250 9 280 0 300
1250 400 200 8 270 0 600
1500 400 200 7 260 0 600
250-1500 50 oor 250 ~1 ~91 0 75
50 idle ~60 typical 200 idle 500