R·I·T Title: ASML Stepper
Semiconductor & Microsystems
Fabrication Laboratory
Revision: B Rev Date: 12/21/2010
RIT SMFL Page 6 of 11
6.2.6 If your reticles do not have bar codes, use the Specify button to enter reticle IDs
and then the Apply button to confirm. This will have to be done each time the
reticles are loaded into the machine.
6.2.7 When finished, the reticle box should be stored on the stepper.
6.2.8 Press Cancel and Exit back to the Main Menu.
6.3 Loading Wafers
6.3.1 Lift the cover to the loader and place the cassette of wafers on the stage. Make sure
that the cassette is properly seated.
6.3.2 Place an empty cassette on the receiver. All 4 stations should have a cassette.
6.4 Defining a Batch and Running a Stepper Job
6.4.1 From the Main Menu, select 2- Batch Control and 1 – Define Batch.
6.4.2 The Batch ID is the name that you use to identify your wafers.
6.4.3 The Job Name is the name of the stepper job that you want to use. Click the Select
button, scroll down, select the job and Accept at the top of the screen. Writing a
stepper job is detailed in a separate document.
6.4.4 Click on the line to the right of Layer ID. Select the Layer Number that you want
to expose when the box comes up. Layer number zero is used for exposing the
alignment marks onto the wafer. See attachments for more information on the zero
level.
6.4.5 The Control Mode may be set to Wor C. A setting of Cwill expose all of the
wafers in the cassette. A setting of Wwill only expose the number of wafers that
you specify.
6.4.6 The Batch Size is the number of wafers or cassettes that you want to expose.
6.4.7 Under Batch Type select Pfor production. Fwill allow you to do a focus
meander, Ewill allow you to do an energy meander and Mwill allow you to do a
matrix.
