FILMETRICS F54 User manual

Filmetrics F54
Thin Film Mapping Analyzer
User Manual

WARNINGS
DO NOT TOUCH/BEND THE FIBERS KEEP HANDS AWAY (high speed stage)

WARNINGS
DO NOT TOUCH/SCRATCH:
stage reference & background mirror
AVOID SAMPLE CRASH:
Measurement objectives

Turn the light source on
Tool usually
always ON

Start the FILMapper software
Stage initializes without warnings:
KEEP HANDS AWAY!

Move the stage to Load position
RISK OF DAMAGING THE OPTICS:
Do not load with stage under the objective!

Sample loading: good practice
OK (stage at 0,100) NO EXCHANGE UNDER OBJECTIVE!

Choose a Recipe and Edit it
From Wafer Map tab: From Measurement tab:
(Under Thickness, n, k, r )

Pick a Recipe
•CMi folder: standard recipes
(DO NOT MODIFY)
•Users folder: custom recipes

Define the stack (Film Stack tab)
•Choose the units (µm, nm, Å)
•Define
substrate/film(s)/medium
•Input expected thickness
(nominal ± range),
tick to measure (enable fit)
•-> Move to Analysis Options

Specify Analysis Options
•Limit the Wavelength Range if
appropriate
•Adjust moving-average
Smoothing to denoise the
spectrum (use >=1000um to
disable)
•Change Method to Exact for
stacks and/or thickness <150nm
-> Move to Wafer Map

Choose a Wafer Map
•Modify measurement
configuration (sample size,
number of points, exclusion, …)
•OK to limit autofocus in center
for the sake of speed
-> Move to Acquisition Settings
Advanced options (including Deskew) under Wafer Map tab: Edit -> Map Pattern…

Acquisition settings
•Enable/disable Autofocus
•Available methods are Goodness
Of Fit, Max of reflectometer
signal, and Image-based focus
•Save As to create a new recipe
(DO NOT OVERWRITE CMi ones)
-> Acquire a Baseline (optional)
and perform a Measurement

Objective and Baseline
•Select the objective matching
the current configuration
(IMPORTANT!)
•Optional: take a Baseline
measurement
(lamp warm-up time ~5min)

Objectives
•5x -red ring (spot size 50µm)
•15x -violet ring (spot size 17µm)

Baseline procedure
1. Load your sample
2. Acquire sample reflectance
3. Unload sample
and load reference standard (Si)
4. Acquire
reference standard reflectance
5. Let the machine acquire the
background (45° mirror) and align
the stage
6. Unload reference standard
and load your sample
To move the stage (when prompted)
•Loading position is (100,0)
•Wafer center is (0,0)
Height for best autofocus
on 525µm-thick wafers

Baseline calibration sample for SiO2 on Si
Filmetrics calibration sample:
1. Sample reflectance calibration
region (go to 30,0)
2. Reference reflectance
calibration region (go to 0,0)
3. (patterned sample region)
One Si wafer available for
reference reflectance calibration
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Baseline steps
1. Sample reflectance (your wafer) 2. Reflectance standard (Si wafer)

Baseline warning
Software issues a warning in case
of important intensity difference
after new baseline
This can be due to
•Lamp state (off or burnt, not
warmed-up)
•Objective used for last baseline
Acknowledge if it makes sense!

Point measurements
•Navigate to the point of interest
by means of
•camera and r/theta controls
(arrows), or
•Go To… button (wafer center: 0,0)
•Clic Measure
Check goodness of fit (GOF)