PVA TePla IoN 3 User manual

Document No.: 1P0446-1 Rev. B, April 7, 2014
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TECHNICAL MANUAL
OPERATION AND MAINTENANCE
IoN 3 MHz
251 Corporate Terrace
Corona, California 92879
951-371-2500

Document No.: 1P0446-1 Rev. B, April 7, 2014
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NOTICE
This is a PVA TePla America Inc. publication which is protected by copyright. Original copyright date
2010. No part of this document may be photocopied, reproduced, or translated to another language
without the prior written consent of PVA TePla America Inc. The information contained in this
publication is subject to change without notice.
Contact Us
PVA TePla America Inc.
251 Corporate Terrace
Corona, CA 92879 USA
Customer Service: [phone]
Direct: [phone] x221
Toll Free: [phone]
Website: www.pvateplaamerica.com
Email: [email protected]

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Table of Contents
Section 1 - Introduction ...................................................................................................... 4
1.1 Overview .................................................................................................................. 4
1.2 Standard Equipment .................................................................................................. 5
1.3 Equipment Options .................................................................................................... 9
Section 2 - Safety .............................................................................................................. 10
2.1 Warnings ................................................................................................................ 10
2.2 Interlocks ............................................................................................................... 12
Section 3 - Unpacking ....................................................................................................... 13
3.1 Long Term Storage .................................................................................................. 13
Section 4 - Installation ...................................................................................................... 14
4.1 Facilities Requirements ............................................................................................ 14
4.2 Recommended Work Area Allowance ........................................................................ 15
4.3 System Assembly .................................................................................................... 16
4.4 Initial Startup .......................................................................................................... 17
Section 5 - Equipment Orientation .................................................................................... 19
5.1 General Description ................................................................................................. 19
5.2 Controls and Indicators ............................................................................................ 20
Section 6 - Theory of Operation ........................................................................................ 23
Section 7 - Operation Procedures ..................................................................................... 25
7.1 Standard Operating Procedure .................................................................................. 25
Section 8 - Service and Maintenance ................................................................................ 26
8.1 Requesting Service .................................................................................................. 26
8.2 User Maintenance .................................................................................................... 26
8.3 Troubleshooting ...................................................................................................... 27
8.4 Warranty ................................................................................................................ 30

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Section 1 - Introduction
The IoN 3 MHz Operation and Maintenance Technical Manual provides a complete reference to all
system controls. All user-level hardware, interfaces and directions are described, along with their
associated operating procedures.
The safety section points out any risks involved with equipment operation along with
recommendations for safely operating and maintaining the system. The safety features included with
the system are also outlined.
The unpacking and installation sections help with initial first time startup.
The theory section explains the principals behind plasma generation and the variables that are under
operator control during process development and optimization. The goal is to give the beginning
plasma process engineer a starting point for developing plasma treatments for various applications
using the IoN 3 MHz equipment. The user should contact PVA TePla America Inc. if more detailed
process development assistance is required for a specific application.
The equipment section gives a detailed description of the controls and indicators.
The operation section gives step by step instructions for operation of the equipment.
The service section contains the information on warranties, preventative maintenance, trouble
shooting, and parts replacement.
Text conventions used in the manual are as follows:
buttons the operator is instructed to actuate are listed in all CAPITAL LETTERS.
section headings are in color, bold print and/or UNDERLINED.
Nomenclature for data entry in this manual and on the system itself uses:
Torr in reference to pressure
Watts (w) for power
seconds (secs) or minutes (mins) for time
1.1 Overview
The IoN 3 MHz plasma system is a tabletop plasma chemistry reactor designed to provide the failure
analysis, medical, scientific and educational community with a plasma system at moderate cost. It is
designed to provide repeatable plasma processing for ashing, cleaning or etching.
The IoN 3 MHz a batch-mode plasma system for etch, strip, clean, and surface treatment. It
combines field-proven features, which minimize machine-generated particulate with the process
flexibility of computer control. This combination offers ultimate performance: high throughput, low
particulate generation, process versatility, precise parameter control, and fault isolation.

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1.2 Standard Equipment
CHAMBER
A special grade of 6061-T6 Aerospace grade of aluminum is used for the chamber and chamber door.
The aluminum chamber has been anodized with a proprietary process that improves the durability of
the chamber and improves the reliability of plasma or RIE processing. This anodized process is
proprietary and the thickness is closely monitored and measured to ensure repeatable plasma
processing. This is the same anodization procedure used in million dollar plus production plasma
systems used in the manufacture of semiconductors.
Incoming process gas is feed into the chamber by the port on the top left of the chamber (when
viewed from the front of the system). The screened outlet in the bottom right leads to the vacuum
valve and thus to the vacuum pump.
SAMPLE HOLDER
A sample holder is provided—the top shelf is for "Direct Plasma" and the bottom (middle) shelf is for
"RIE".
Figure 1-1 Sample holder
The RF feed through rails design, on the inside-back of the chamber, provides RF and ground to the
sample holder by way of two small rail clamps. The sample holder is inserted into the chamber and
makes contact with the RF connection in the back center of the chamber. The ground is provided by a
ground rail connection on the back of the chamber. As you face the chamber, the rail on the left is
the ground, and the rail on the right is the RF connection.
The sample holder should always be used and the operator should ensure that the sample holder is
pushed all the way in—making contact with the RF FEEDTHROUGH and ground lead.

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Figure 1-2 RF Feed through rails
NOTE: The sample holder must be properly inserted into the chamber for the system to operate
correctly. The audible alarm will alarm if the sample holder is not inserted into the chamber, and the
system will not start.
RF GENERATOR
An internal 13.56 MHz RF power supply is installed as part of the system. The RF generator is a solid-
state crystal-controlled oscillator designed to provide up to 150 watts of continuous wave 13.56 MHz
power to the reaction chamber. One of the limited number of frequencies permitted by the Federal
Communications Commission (FCC) for plasma applications, 13.56 MHz is probably the overall best in
terms of plasma uniformity and speed.
Maximum power transfer from the power supply to the reaction chamber is accomplished by
matching the output impedance of the generator to the input impedance of the reaction chamber.
AUTOMATIC TUNING
An auto tuning system is installed for the impedance matching network. The auto tuning adds
circuitry which continually monitors the forward-to-reverse power ratio during processing and
positions air capacitors for optimum power transfer to the CHAMBER.
The air capacitors in the tuning network are designed to rotate in a circular fashion without stopping
to reverse direction—this allows for very quick tuning in the IoN 3.
An audible alarm will sound if a high reflected power is detected when a process is initiated. If this
condition does not resolve itself within 25 seconds the process will abort.
GAS CONTROL FLOWMETER
Two flowmeters are provided to regulate the flow of gas into the chamber. The vacuum pressure of
the chamber is regulated by the flow of gas into the chamber. The more flow, the higher the
pressure.

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Each flowmeter has a solenoid valve that shuts off the flow of gas, thus retaining the setting of the
respective flowmeter for a subsequent process. For added safety, the gas solenoid for each
flowmeter will not allow gas to flow into the chamber until all interlocks are activated.
Note: The inlet pressure from the gas bottle should be regulated to 10 psig before the gas is
introduced to the back of the IoN 3 MHz.
Table 1 Flowmeter Calibration Data
float material: GLASS BALL float density: 2.55 G/CC
metered Temp: 70ºF metered Pressure: 10 PSIG
tube #A-125-3 units: CC/MIN
scale
O2
Argon
Freon14
SF6
65.0
68.56
47.62
44.82
34.61
60.0
59.20
41.31
39.05
30.16
55.0
49.84
35.03
33.31
25.71
50.0
41.30
29.16
27.83
21.49
45.0
34.17
24.09
22.93
17.70
40.0
28.41
19.71
18.61
14.37
35.0
23.53
15.79
14.86
11.47
30.0
19.21
12.44
11.68
9.02
25.0
15.01
9.69
9.03
6.97
20.0
11.30
7.40
6.81
5.26
15.0
8.46
5.39
4.90
3.78
10.0
6.10
3.54
3.15
2.43
5.0
3.74
1.69
PRESSURE INDICATOR
The IoN 3 MHz will report the actual pressure reading (accurate within 20 mTorr) on the front
PRESSURE display. This pressure reading will give a reading of the chamber pressure. After the
PROCESS START button has been depressed, the pressure sensor signals the system logic to start the
process (RF and gas flow) when a crossover pressure of .35 Torr (350mT) has been achieved.
The PRESSURE indicator does not display a reading until reaching a pressure below 2 Torr. The
pressure sensor has a range of around .01 Torr (10 mTorr) to 2 Torr. Normal operating pressure will
range between .5 Torr (500mT) and 1.2 Torr.
DIAGNOSTIC LED DISPLAY INDICATORS
Five LED display indicators are located on the lower front panel of the IoN 3 MHz system. When
illuminated, the LEDs provide the user confirmation that all the system modules are functioning
correctly.

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TIMER
The IoN 3 timer will only start or keep count of elapsed time when the system is tuned and in a
working mode. This proprietary design means that the set time is the actual amount of time that the
samples are exposed to a working plasma. Many competitive plasma systems merely start the timer
when the system starts tuning—not when the system is actually processing samples with an active
plasma.
The RF timer will abort the process if the reflected power exceeds its threshold. So should the
system loose the plasma, the process timer stops since the RF reflected power will be over limit. An
audible alarm will beep until the system tunes and the reflected power drops within acceptable limits.
In cases where the process pressure is too high to tune, the system will fault out in 25 seconds. The
user has the ability to abort the process if they choose to do so by depressing the PROCESS ABORT
toggle switch. This gives the system the ability to run a full length process under potentially marginal
conditions, where competitive plasma systems would turn out unfinished parts. It also removes the
variability of the operator--whether or not they waited until the system had reached base pressure
before starting.
The timer displays a selectable range of 6 second to 999.9 minutes.
Figure 1-3 Timer

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1.3 Equipment Options
This is a list of non-standard system accessories. Your IoN 3 MHz can be upgraded to include any of
these options. For additional information, contact PVA TePla America Inc.
VACUUM PUMP
PVA TePla America recommends a 7 cfm, 2 stage, rotary vane pump, prepared for Fomblin oil. It is
recommended that Fomblin oil be used for oxygen gas applications as well as other gas mixtures.
Note: The sound pressure level with the above pump is 50 dB.
PUMP OIL MIST ELIMINATOR
Collects and condenses the oil mist generated during pump operation. This leads to lower pump oil
consumption and a cleaner operation.
If the system is to be run with a fluorine based process gas, a mist eliminator is suggested.
SPARE PARTS KIT
Includes spare parts that will be required for normal preventative maintenance. Includes chamber
door o-ring seal, viewport window, chamber o-ring, and rear chamber o-ring.

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Section 2 - Safety
This section covers the safety issues associated with the IoN 3 MHz. It describes the system safety
features. Any inherent equipment hazards are outlined. Details on necessary precautions for safe
operation are provided.
When used properly, your IoN 3 MHz plasma system is very safe and has been tested to comply with
CE standards. The purpose of this advisory is simply to point out possible hazards resulting from
misuse of the equipment and to suggest ways of operating the equipment as safely as possible.
2.1 Warnings
Alerts containing the words NOTE, CAUTION, WARNING and DANGER are used in various
advisories in this manual.
NOTE are advisories that point out important information that is not obvious to the reader, but will
not lead to any hazardous situations or immediate equipment damage if not followed.
CAUTION implies that the action could possibly cause damage to equipment or injury to
personnel if the proper procedures are not followed.
WARNING or DANGER implies that the action places the operator in a situation that has a
possibility of injury or death if the proper procedures are not followed.
ELECTRICAL
As with all electrical equipment powered from line voltage, caution is warranted whenever external
panels are removed and/or electrical wiring is exposed. All electronics are designed with safety in
mind and conform to common voltage directives. Internal DC voltages generated are +12 /- 12 volts,
or 24 volts maximum.
Electrical Hazard Warning—Warns personnel that special caution
must be exercised. A caution alert stresses the importance of following
proper operating or maintenance procedures. Otherwise, equipment
reliability could be affected. This label is located on the back panel, left
and right covers of the IoN 3 MHz.
Do Not Open—Warns users to disconnect the IoN 3 MHz before
removing cover. Only authorized personnel should open the cover due
to hazardous voltage. This warning label should be on the left cover
and on the vacuum pump access cover.
The circuit breaker on the back of the system is designed to cut off the flow of electricity if the
demand is over 10 amps. To reset the system, toggle this circuit breaker to the ON (or up) position.
Note: For your safety, only qualified electrical technicians should perform maintenance, repair or
installation on the equipment.

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RADIO FREQUENCY RF EXPOSURE
A hazard from RF exposure exists if the system is operated without the door closed and/or the
exterior panel in place. This would require defeating safety interlocks and is not recommended.
RF Radiation Hazard—Warns personnel of an RF energy radiation
hazard. The IoN 3 MHz unit uses an RF generator, which produces RF
energy at levels that may cause burns. Improper connections or
operations without protective covering may result in RF radiation
exceeding safety standards. This label is located on or next to the load
door, left and right covers.
CHAMBER PROXIMITY
The plasma chamber can become quite hot during some processes. Exercise caution to prevent
burns.
Thermal Hazard—Warns personnel of hot surfaces inside the
machine that may cause burns if touched. It should be on or next to
the load door.
UV Warning—Warns personnel that looking into the UV light may be
hazardous. The IoN 3 MHz has UV shielding on the outside of the
viewport window. This warning label is located on or next to the load
door.
CHEMICAL HAZARD
The pump oil can be a skin and eye irritant. Gloves and eye protection should be used when changing
or adding pump oil.
Wear Protective Gloves—Warns personnel that hazards exist that
require them to wear protective gloves. It should be on or next to the
load door.
PROCESS GASES
The IoN 3 MHz was designed for use with inert gas, oxygen, argon, SF6 and CF4.
Certain process gases that the operator may select for use with this equipment may be hazardous.
Some may require special precautions. These precautions vary depending on the gas. Consult with

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your safety officer to ensure proper precautionary steps are taken before bringing any new gas into
your facility. Toxic or flammable gases should never be used in the IoN 3 MHz.
Gas line integrity can be confirmed simply by opening the valve on the gas cylinder then quickly
closing it again. If the pressure reading on the regulator drops within one minute, there is a
substantial leak that could be dangerous.
Caution: If oxygen is used,“NOSMOKING”signsshouldbepostednear the
instrument and the no smoking ban observed.
NOTE: The IoN 3 MHz system is designed to be used in a temperature range of 55-85 degrees
Fahrenheit and with a relative humidity of 10-90% noncondensing. The IP rating is IP20.
2.2 Interlocks
There are two double interlock switches on the IoN 3 MHz system case (on the top of the left side
cover and on the top of the back-right pump cover), and one single interlock switch that is activated
when the chamber door is closed. DO NOT OVERRIDE THESE SAFETY INTERLOCKS.
These interlocks are engineered into the IoN 3 MHz to prevent injury to operating personnel. These
will shut off RF power if they are not activated. The chamber door must be closed for the RF to
activate. If all safety interlocks are connected, you will hear the fan activate when closing the
chamber door.
Care should be taken when replacing the electronics covers. The top cover interlock switches are
sturdy, but if broken, the system will not activate the RF. The double interlock switches should be
tested periodically.
An additional safety interlock is provided electronically through the VACUUM VALVE to prevent the RF
from activating unless the pressure system confirms that the IoN 3 MHz chamber is under vacuum.
WARNING: DO NOT OVERRIDE THE SAFETY INTERLOCKS

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Section 3 - Unpacking
The IoN 3 MHz Plasma System is completely tested and inspected at the factory before shipping.
Inspect the crate before unpacking. If there is any reason to suspect damage to the carton or its
contents, make note of the damage, take pictures and report it to the shipping company. All pictures
and information should be sent to PVA TePla America Inc. as well. All systems are shipped with tilt
indicators. Your shipping department should inspect the crate and all tilt indicators prior to accepting
the shipment.
Using the included packing list, check to ensure that all listed components have arrived at your
facility. Unpack the shipping cartons carefully and inspect the main plasma unit and all other system
components for any damaged or missing items.
If any component is damaged or missing, notify the shipper and notify the PVA TePla America Inc.
Customer Service Department by TELEPHONE immediately. Claims based on late notification of
shipping damage will be denied.
Keep all shipping containers and materials in case it should be necessary to return any item to PVA
TePla America Inc. All service and warranty work is done atthemanufacturer’ssite.
Place the system components on the selected work surfaces. Remove all packing materials including
any that might be present in the chamber of the system. Please view the video on the proper start-up
of your IoN 3 MHz before starting your system.
3.1 Long Term Storage
If the plasma system and vacuum pump are to be placed in long term storage, take the following
precautions in order to keep the equipment in good working condition. All system components should
be placed in protective packaging. A desiccant should be placed in the packaging to minimize
moisture exposure. Storage should be in a room with humidity less than eighty percent.
Before packaging and storing the vacuum pump, fill the pump reservoir with oil to the proper level
and run the pump for five minutes to lubricate the seals. During the time the pump is stored, you will
also need to run the pump for five minutes every three months in order to keep the seals lubricated.

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Section 4 - Installation
This manual outlines the requirements for system installation, work area allowance, and initial startup
procedure. The installer should refer to Safety warnings and Unpacking instructions on the previous
pages before beginning installation.
4.1 Facilities Requirements
The specifications and requirements for the system and applicable options are listed as follows:
System :
 Weight : 75 lbs. Designed for use on table top or counter
 Dimensions (door closed) : 13.75" W x 13.5" H x 21.5" L (349.25 x 342.9 x 546.1mm)
Chamber :
 Dimensions (interior) : 5 x 5 x 6" Deep (127 x 127 x 152.4 mm)
 Material : 6061-T6 high grade aerospace aluminum
Electrical :
110-220VAC, 1 phase, 10 amp, 50-60 Hz, 18 AWG, 3 wire. The power cord is supplied by PVA
TePla America Inc.
Process Gases :
Regulated to 10 PSIG before entering the system
Connections made by .25”O.D.corrosion resistant materials such as stainless steel or Teflon
tubing (supplied by purchaser). Other materials can generate particulate matter via corrosion
which will clog gas shutoff valves.
Gas Fittings :
1/4" FPT fittings (the gas lines will need ¼”Swagelok ferrule style compression fittings--to
connect the incoming gas to the back of the IoN 3 MHz system)
Vacuum Pump :
a KF25 flange is required to connect the vacuum hose to the IoN 3 MHz.
Internal RF Power Generator:
150 Watts +/-5%@ full load output into 50 Ohm impedance
13.5MHz operating frequency
Solid state circuitry
Automatic impedance matching

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4.2 Recommended Work Area Allowance
Do not block the ventilation openings on the IoN 3 MHz system. Room air is drawn into the system
through the two vents on either side of the system and out through the upper fans on the back top of
the system. Blocking the vents or preventing proper air flow could cause the system to overheat and
malfunction.
Figure 4-1 Work Area Allowance
Youwillneedapproximately23”inthebackofthesystemwhenyouchangethepumpoil.

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4.3 System Assembly
The IoN 3 MHz plasma system is a tabletop system and essentially comes pre-assembled. Devote
attention to providing a good facility services infrastructure to the system:
a sturdy surface in a ventilated location with ample work allowance
proper electrical outlets for the system and vacuum pump, dedicated circuits if possible
regulated corrosion-resistant process gas delivery (if used)
pump exhaust capability
The pump exhaust should have an exhaust line that vents outside of the facility. To ensure rapid
pump-down times, position pump as close as possible to the IoN 3 MHz, but not on same surface
(due to possible vibration from the pump).
SYSTEM CONNECTIONS
1. With a voltmeter verify the line voltage is correct, then plug in the system AC cord.
2. Make sure the circuit breaker on the back of the IoN 3 MHz is in the up (on) position.
3. Connect vacuum pump to the system with a vacuum hose and a KF25 flange connection.
4. Make sure the pump has been charged with oil, then plug in the vacuum pump AC cord.
Figure 4-2 system connections

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Figure 4-3 vacuum hose
4.4 Initial Startup
After the machine has been properly installed, you can begin operation. But before starting any
vacuum system, it is advisable to first check the vacuum integrity.
VACUUM INTEGRITY CHECK
The IoN 3 MHz provides a means of monitoring chamber pressure. An internal Pirani pressure gage
will report a pressure reading on the front DISPLAY when the SELECTOR is turned to the PRESSURE
position.
1. Make sure the AC power cord is connected and circuit breaker is in the ON (up) position.
2. Push AC ON.
3. Turn on the vacuum pump at the pump.
4. Set display SELECTOR switch to PRESSURE (TORR).
5. Depress the VACUUM switch to commence pumping down the reactor chamber.
6. Observe the chamber pressure level on the display; it should read 1 Torr in less than 5 minutes
and under .35 Torr after 20 minutes.
7. Wait 20 minutes to allow any residual moisture to exit the system.
8. Note the working pressure. If a front panel pressure reading below .35 Torr is not reached, check
chamber interior for cleanliness and/or commence leak detection procedure (detailed in
Troubleshooting section). A slight vacuum leak should not disturb standard processing or
compromise the system. Make sure your vacuum pump is in good working order.

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PROCEDURE FOR ADJUSTING GAS FLOW AND PRESSURE
Gas flow into the chamber must be controlled to achieve proper operating pressure. This is easily
accomplished through use of the system flowmeter. The gas solenoid valve will not allow gas into the
chamber unless all system safety conditions have been met.
The IoN 3 MHz provides a means of monitoring chamber pressure. A pressure gage is mounted in the
rear port of the IoN 3 MHz chamber, and will report a pressure reading on the front DISPLAY. This
pressure reading will give a relative measure of the system pressure, and is meant to provide a low
cost means of monitoring pressure. The operator will need to note the pressure readings on the
DISPLAY and know the relationship of the displayed number to the process required.
Normal operating pressure will range between .5 Torr and 1.2 Torr.
BEGIN OPERATION
With the system pumped down and flowing gas, adding RF power will strike a plasma. Consult the
Operation Procedures chapter of this manual for a detailed Standard Operating Procedure to
accomplish these steps.

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Section 5 - Equipment Orientation
This section includes a general description of the plasma system as well as a more detailed
description of the controls and indicators.
5.1 General Description
The IoN 3 MHz system is a tabletop plasma chemistry reactor designed to provide the medical,
scientific, and educational and microelectronics community with plasma technology at a moderate
cost. PVA TePla America Inc. is able to provide such capability by providing a simple to operate
instrument which can perform repeatable plasma chemical reactions.
Figure 5-1 IoN 3 MHz
The IoN 3 MHz is equipped with an internally housed, solid-state RF Power Supply. This RF Power
generator is a solid state crystal controlled oscillator designed to provide up to 150 watts of
continuous wave 13.56 MHz power to the reaction chamber. The frequency of 13.56 MHz is one of a
limited number of frequencies permitted by the Federal Communications Commission (FCC) for
plasma applications.
Maximum power transfer from the power supply to the reaction chamber is accomplished by
matching the output impedance of the amplifier to the input impedance of the reaction chamber.
The front of the IoN 3 MHz consists of a front control panel containing the function controls, abort
switch,diagnosticLED’sandtimer. The main PC board that controls the IoN 3 MHz system functions
is mounted directly behind the front display. In order to allow for easy and modular repair, the front
panel can be removed and replaced with a different front panel and PC board, if needed.
The back panel has the utility supply, and breaker. Inside the IoN 3 MHz enclosure is a system
controlled gas feed solenoid valve, a vacuum port system, PC boards and the impedance matching
network which ensures efficient transfer of power from the RF power supply to the reactor chamber.
The front loading chamber and chamber door are made from aluminum. The backside of the
aluminum sample holder is designed to connect to the RF feedthrough rail and Ground feedthrough
rail on the back center of the aluminum chamber.

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NOTE: The sample holder must make secure contact with both RF and Ground feedthough rails for
proper plasma processing. The IoN 3 MHz should always be operated with the sample holder in place.
The reaction chamber is accessed by opening a hinged door. The chamber door is held in place when
the system is put under vacuum, and a gasket around the rim of the chamber ensures vacuum-tight
sealing between the chamber door and the rest of the chamber. The chamber door hinges are
designed to be loose and slightly offset in order to equalize the inward force on the chamber.
The chamber and chamber door material is extruded, not welded, from 6061-T6 high grade
aerospace aluminum. This ensures good vacuum integrity.
The vacuum system includes a VACUUM PORT (to which the vacuum pump is attached), VENT VALVE
and EXHAUST MANIFOLD. The VENT VALVE isa“normallyopen”valvethatwillallowthechamberto
vent to atmosphere whenever the VACUUM PORT is not activated. This“normallyopen”ventvalveis
also a safety feature.
When the VACUUM switch is released or turned off (no illumination), the chamber is isolated from the
pump and the VENT VALVE allows air to pass into the vacuum chamber through the VENT VALVE,
venting the system to atmospheric pressure.
The IoN 3 MHz has an electronically controlled gas solenoid valve that will open to allow gas into the
chamber when the RF comes on. If the process is stopped, timed out or aborted, the gas inlet
solenoid valve will close. It is a “normally closed” valve, and in case of loss of electrical power, it will
close preventing gas from entering the chamber.
5.2 Controls and Indicators
This section describes the controls and indicators on the front and rear of the IoN 3 MHz system.
Figure 5-2 front panel